Nano at TU München

Flashcards and summaries for Nano at the TU München

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Which kinds of Nanofabrication by scanning probes do you know?

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Name one way of Nanofabrication by replication!

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Name a way of Nanoscale pattern transfer!
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Shortcut: OL

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Which Photon Sources do you know (topic Illumination with Shorther Wavelengths)?

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Excimer Lasers (DUV, 193 nm)

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Issues with DUV (at 157 nm)
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EUV (13 nm) and X-ray (<1 nm)

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Vocab: Immersion lithography

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Name issues for Immersion lithography

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Relevant historic steps in immersion lithography?
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Near-field Optical Lithography (NFOL)

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Exemplary flashcards for Nano at the TU München on StudySmarter:

Nano

Which kinds of Nanofabrication by scanning probes do you know?
- STM-based resist exposure (Belichtung) - Local Oxidation lithography - Additive und Subtractive Nanofabrication

Nano

Name one way of Nanofabrication by replication!
Nanoimprint Lithography

Nano

Name a way of Nanoscale pattern transfer!
Wet and Dry Chemical Etching

Nano

Shortcut: OL
Optical Lithography

Nano

Which Photon Sources do you know (topic Illumination with Shorther Wavelengths)?
- Excimer Lasers (DUV, 193 nm, DUV: Deep Ultra Violet) - Excimer Lasers (DUV, 157 nm, DUV: Deep Ultra Violet) - EUV (13nm, Extreme Ultra Violet, or XUV) - X-ray (<1nm)

Nano

Excimer Lasers (DUV, 193 nm)
- high photon energy - short wavelength

Nano

Issues with DUV (at 157 nm)
- optical lens material (CaF...birefringence effects: Doppelbrechungs-Effekte) - transparent mask pellicles (Häutchen) - proper photoresists (lichtundurchlässiger Platinenlack) ... due to high absorption in UV!!!

Nano

EUV (13 nm) and X-ray (<1 nm)
- no conventional refractive optics (lichtbrechende Optik) --> reflective optics (mirrors) --> proximity gap (1:1) lithography - mask needs absorber layer (Al, Cr, ..) -prone to defects and image errors (prone: geneigt) - extremely expensive

Nano

Vocab: Immersion lithography
Immersionslithograpie, Immersion: Eintauchen, Lithography: Litographie/ (Stein-)Druckverfahren

Nano

Name issues for Immersion lithography
maintain bubble-free liquid between lens and wafer ((Silizium)-Scheibe) by fast moving stage

Nano

Relevant historic steps in immersion lithography?
- major breakthrough in 45-nm node technology (2007) - Development of high-index fluids (1.8-2) --> sub-32 nm node technology?

Nano

Near-field Optical Lithography (NFOL)
- Light propagates as evanescent wave with exponential decay in resist - mask in direct contact OR proximity gap with resist - Penetration (Eindringtiefe) of light only 40 nm of resist (Leiterplattenschutzschicht) - Large field enhancement at edges of metal mask pattern - Local E-field intensity > |E0|^2 ...surface plasmon polariton (SPP)!!

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Natwi at

Pädagogische Hochschule Karlsruhe

Nachweis at

Universität des Saarlandes

Nanotechnology at

Universität für Bodenkultur Wien

Nanotech at

University of Milan

Nanotech nanoparticles at

University of Milan

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